发明名称 FIELD-EFFECT TRANSISTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a field-effect transistor solving the problem that carriers in an electron transit layer concentrate on the vicinity of a heterointerface of small mobility to make it difficult to increase electron mobility and also solving the problem that the mobility cannot be made high because of impurity scattering. <P>SOLUTION: The field-effect transistor includes, on a semiconductor substrate, an electron supply layer composed of a wide-gap semiconductor doped with an n-type impurity to have a wide bandgap, and the electron transit layer composed of a narrow-gap semiconductor layer having a narrower bandgap than the electron supply layer, wherein the electron transit layer comprises three layers of a first non-doped layer containing no impurity, a doped layer containing an impurity, and a second non-doped layer containing no carrier, and a dopant concentration of the doped layer, containing the impurity, in the electron transit layer is &ge;1&times;10<SP>16</SP>and <1&times;10<SP>17</SP>cm<SP>-3</SP>. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011044641(A) 申请公布日期 2011.03.03
申请号 JP20090193037 申请日期 2009.08.24
申请人 ASAHI KASEI ELECTRONICS CO LTD 发明人 TOITA MASATO;TOGA HIROTAKA
分类号 H01L29/812;H01L21/338;H01L29/778 主分类号 H01L29/812
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