| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus that continuously conducts a plurality of treatments including film formation by CVD while transporting a long substrate in a longitudinal direction, in which each chamber does not receive a harmful effect originating in pressures from adjacent chambers, and also can reduce the contamination in the apparatus due to a reaction gas. SOLUTION: This film-forming apparatus has a differential pressure chamber having an exhaust means provided between a CVD film-forming chamber and an upstream or downstream treatment chamber, and introduces an inert gas and/or gases supplied to both of the film-forming chamber and the treatment chamber into the differential pressure chamber to make the pressure of the differential pressure chamber higher than that of either chamber having a higher pressure between the both chambers. COPYRIGHT: (C)2011,JPO&INPIT |
