| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching treatment device capable of reducing the number of treatment processes, and capable of reducing a facility cost, compared with the case of forming a photomask pattern. SOLUTION: The etching treatment device includes a coating means 14 detachably attachable to an object W to be treated, the coating means coating a prescribed area of a face Wa to be treated of the object W, under a condition of being attached to the object W, and blocking contact with a treating liquid or treating gas in the prescribed area. COPYRIGHT: (C)2011,JPO&INPIT |
