| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce influence of an overlay error caused by heating of a reticle or lens. <P>SOLUTION: A method of determining higher distortion of a patterning device of this lithographic device and an associated device is disclosed. The higher distortion is measured using a transmission imaging device. In a main embodiment, an improved reticle is used which can include an additional alignment diffractive grating in an outer edge part, the inside of a marking-off line of an image field or the image field itself. <P>COPYRIGHT: (C)2011,JPO&INPIT |
