发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a capacitor provided above a substrate including electrodes and a ferroelectric film provided therebetween, a pad electrode electrically connected to one of the electrodes of the capacitor, the pad electrode being formed above the substrate, the pad electrode having a recess on a surface of the substrate, a protective film covering a part of the pad electrode other than the recess on the exposed surface, and a hydrogen absorbing film on the protective film and the recess of the pad electrode.
申请公布号 US2011049675(A1) 申请公布日期 2011.03.03
申请号 US20100941267 申请日期 2010.11.08
申请人 FUJITSU MICROELECTRONICS LIMITED 发明人 NAGAI KOUICHI;SAIGOH KAORU
分类号 H01L29/92 主分类号 H01L29/92
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