| 发明名称 |
CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN |
| 摘要 |
<p>Disclosed is a cyclic compound represented by formula (1). (In the formula, L, R1, R' and m are as defined in the description). The cyclic compound represented by formula (1) has high solubility in safe solvents, is highly sensitive, and enables the formation of a good resist pattern shape. Therefore, the cyclic compound is useful as a component for a radiation-sensitive composition.</p> |
| 申请公布号 |
WO2011024957(A1) |
申请公布日期 |
2011.03.03 |
| 申请号 |
WO2010JP64616 |
申请日期 |
2010.08.27 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC.;ECHIGO, MASATOSHI;HAYASHI, HIROMI |
发明人 |
ECHIGO, MASATOSHI;HAYASHI, HIROMI |
| 分类号 |
C07C39/17;C07B61/00;C07C37/18;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C07C39/17 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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