发明名称 SPECTRAL PURITY FILTER FOR USE IN LITHOGRAPHIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an improved or alternative spectral purity filter. <P>SOLUTION: The spectral purity filter includes a plurality of apertures penetrating a member. The aperture is formed to suppress radiation having a first wavelength, and transmit at least a part of radiation having a second wavelength. The second wavelength of the radiation is shorter than the first wavelength of the radiation. A first region of the spectral purity filter has a first structure that provides a first radiation transmission profile to the radiation, having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second different structure to provide a second different radiation transmission profile to the radiation, having the first wavelength and the radiation having the second wavelength. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011044707(A) 申请公布日期 2011.03.03
申请号 JP20100181176 申请日期 2010.08.13
申请人 ASML NETHERLANDS BV 发明人 SOER WOUTER ANTHON;BANINE VADIM YEVGENYEVICH;WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES;YAKUNIN ANDREY MIKHAILOVICH;JAK MARTIN JACOBUS JOHAN
分类号 H01L21/027;G02B5/20 主分类号 H01L21/027
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