发明名称 PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING
摘要 An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.
申请公布号 US2011049382(A1) 申请公布日期 2011.03.03
申请号 US20100870816 申请日期 2010.08.28
申请人 FEI COMPANY 发明人 MILLER TOM;MIRRO GENE;KOOIJMAN CORNELIS SANDER;VOS HENDRIK JAN DE
分类号 H01J3/14 主分类号 H01J3/14
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