发明名称 Projection illuminating system for micro lithography, has projection lens which forms pattern on light-sensitive layer that is formed on substrate
摘要 <p>The projection illuminating system has a projection lens which forms a pattern on a light-sensitive layer that is formed on a substrate. An electrode is arranged between the projection lens and the light-sensitive layer. An independent claim is also included for a method for operating a projection illuminating system.</p>
申请公布号 DE102010038972(A1) 申请公布日期 2011.03.03
申请号 DE20101038972 申请日期 2010.08.05
申请人 CARL ZEISS SMT GMBH 发明人 RANCK, ALBRECHT;WOLF, ALEXANDER
分类号 G03F7/20 主分类号 G03F7/20
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