发明名称 |
Projection illuminating system for micro lithography, has projection lens which forms pattern on light-sensitive layer that is formed on substrate |
摘要 |
<p>The projection illuminating system has a projection lens which forms a pattern on a light-sensitive layer that is formed on a substrate. An electrode is arranged between the projection lens and the light-sensitive layer. An independent claim is also included for a method for operating a projection illuminating system.</p> |
申请公布号 |
DE102010038972(A1) |
申请公布日期 |
2011.03.03 |
申请号 |
DE20101038972 |
申请日期 |
2010.08.05 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
RANCK, ALBRECHT;WOLF, ALEXANDER |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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