发明名称 Positive Type Photosensitive Composition
摘要 Disclosed is a positive typed photosensitive composition including a polyamide derivative being represented by where R1 and R2 independently represent a bivalent to hexavalent aryl group with at least two carbon atoms, R3 represents either a hydrogen atom or an alkyl group with 1 to 20 carbon atoms, R4 represents either an alkyl group having a linear structure or an aryl group having a linear structure, R5 represents any one of a bivalent to hexavalent aryl group with at least two carbon atoms, an alkyl group having a linear structure, and an aryl group having a linear structure, k and l independently represent an integer of 10 to 1000, n and m independently represent an integer of 0 to 2 (n+m>0), and X represents either a hydrogen atom or an aryl group with 2 to 30 carbon atoms.
申请公布号 US2011053081(A1) 申请公布日期 2011.03.03
申请号 US20090649893 申请日期 2009.12.30
申请人 KOREA KUMHO PETROCHEMICAL CO., LTD 发明人 PARK JOO HYEON;LEE JOUNG BUM;CHO JUNG HWAN;SON KYUNG CHUL
分类号 G03F7/004;C08G69/08 主分类号 G03F7/004
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