发明名称 GRAPHENE FILM AND METHOD FOR PRODUCING SAME
摘要 Disclosed is a novel method for producing a graphene film suitable for industrial use such as application to electronics, whereby a graphene film having a large area, high homogeneity and small domain boundary or a graphene film having well-aligned crystal orientations can be produced at a low cost. Also disclosed is a graphene film. The aforesaid method for producing a graphene film comprises using a substrate provided with an epitaxial metal film that is formed on the surface of a single-crystal substrate, and contacting a carbon material with the surface of the epitaxial metal film to thereby allow the growth of a graphene film. In the aforesaid graphene film which consists of a number of graphene domains, the area of each domain is 0.000001 µm2 to 100000 mm2 and the orientations of 6-membered cycles in the domains are averagely aligned in a single direction all over the graphene film.
申请公布号 WO2011025045(A1) 申请公布日期 2011.03.03
申请号 WO2010JP64848 申请日期 2010.08.31
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY;AGO HIROKI;ITO YOSHITO;TANAKA IZUMI;MIZUNO SEIGI;TSUJI MASAHARU 发明人 AGO HIROKI;ITO YOSHITO;TANAKA IZUMI;MIZUNO SEIGI;TSUJI MASAHARU
分类号 C01B31/04 主分类号 C01B31/04
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