MICROCRYSTALLINE SEMICONDUCTOR FILM AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR

摘要

PROBLEM TO BE SOLVED: To form a microcrystalline semiconductor film having a high crystallinity; and to manufacture a thin film transistor having preferable electric characteristics and high reliability and a display device including the thin film transistor, with high mass productivity. SOLUTION: A step in which a deposition gas containing silicon or germanium is introduced at a first flow rate and a step in which the deposition gas containing silicon or germanium is introduced at a second flow rate are repeated while hydrogen is introduced at a fixed rate, to mix the hydrogen and the deposition gas containing silicon or germanium, and a high-frequency power is supplied, whereby the microcrystalline semiconductor film is formed over a substrate. COPYRIGHT: (C)2011,JPO&INPIT