摘要 |
PROBLEM TO BE SOLVED: To provide a CCP target having a high leakage magnetic flux even if it is thick, for increasing its utilizing efficiency. SOLUTION: The sputtering target for forming a magnetic recording film comprises nonmagnetic oxide, Cr and Pt, and the balance Co with inevitable impurities, and is produced through: a primary sintering step where primarily mixed powder obtained by mixing each raw material powder of the raw material powder made into powder with each element of Co, Cr and Pt as simple substance or as an alloy comprising two or more elements thereamong, and the raw material powder of nonmagnetic oxide is sintered so as to obtain a primarily sintered compact; a pulverizing step where the primarily sintered compact is pulverized so as to obtain primarily sintered compact powder; and a secondary sintering step where the secondarily mixed powder obtained by mixing each raw material powder is mixed with the primarily sintered compact powder, and subsequently, sintering is performed; wherein, a structure composed of the sintered compact of the primarily sintered compact powder is dispersed into a structure made of the sintered compact of the secondarily mixed powder. COPYRIGHT: (C)2011,JPO&INPIT
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