发明名称 SPUTTERING TARGET FOR FORMING MAGNETIC RECORDING FILM, AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a CCP target having a high leakage magnetic flux even if it is thick, for increasing its utilizing efficiency. SOLUTION: The sputtering target for forming a magnetic recording film comprises nonmagnetic oxide, Cr and Pt, and the balance Co with inevitable impurities, and is produced through: a primary sintering step where primarily mixed powder obtained by mixing each raw material powder of the raw material powder made into powder with each element of Co, Cr and Pt as simple substance or as an alloy comprising two or more elements thereamong, and the raw material powder of nonmagnetic oxide is sintered so as to obtain a primarily sintered compact; a pulverizing step where the primarily sintered compact is pulverized so as to obtain primarily sintered compact powder; and a secondary sintering step where the secondarily mixed powder obtained by mixing each raw material powder is mixed with the primarily sintered compact powder, and subsequently, sintering is performed; wherein, a structure composed of the sintered compact of the primarily sintered compact powder is dispersed into a structure made of the sintered compact of the secondarily mixed powder. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011042867(A) 申请公布日期 2011.03.03
申请号 JP20100073959 申请日期 2010.03.28
申请人 MITSUBISHI MATERIALS CORP 发明人 JOHO MASANORI
分类号 C23C14/34;B22F1/00;B22F3/00;B22F3/14;B22F9/04;C22C1/05;C22C5/04;C22C19/07;G11B5/82;G11B5/851 主分类号 C23C14/34
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