发明名称 EXPOSURE HEAD AND IMAGE FORMING APPARATUS
摘要 An exposure head includes: a light emitting element substrate in which light emitting elements are arranged in a first direction; first lens arrays with first lenses, to which the light from the light emitting elements is incident, arranged thereon; second lens arrays with second lenses, to which the light emitting from the first lenses is incident, and each of which constitutes with each of the first lenses an optical system whose absolute value of a lateral magnification is less than one, arranged thereon; first spacers which are arranged on the light emitting element substrate and support the first lens arrays; and second spacers which are arranged on the first lens arrays so as to be in different positions from those of the first spacers when seen from an optical axis direction of the optical system and support the second lens arrays.
申请公布号 US2011050835(A1) 申请公布日期 2011.03.03
申请号 US20100843584 申请日期 2010.07.26
申请人 SEIKO EPSON CORPORATION 发明人 SOWA TAKESHI;IKUMA KEN
分类号 B41J2/435 主分类号 B41J2/435
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