LITHOGRAPHIC APPARATUS, DISTORTION DETERMINATION METHOD AND PATTERNING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus with reduced overlay errors resulting from higher-order distortions of a patterning device.

SOLUTION: The lithographic apparatus arranged to transfer a pattern from the patterning device onto a substrate is provided, wherein the apparatus is operable to measure higher-order distortions and/or image plane deviations of the patterning device, the apparatus includes: a device for transmission image detection; and a processor configured and arranged to model higher-order distortions of the patterning device using signals received from the device for transmission image detection; wherein the patterning device has a main imaging field and a perimeter and the apparatus is operable to model the higher-order distortions using signals resultant from alignment structures comprised in the perimeter and/or in the imaging field.

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