发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a gate on a semiconductor substrate. One side wall of the gate may include at least one protrusion and an opposite side wall of the gate may include at least one depression. A contact is formed through an insulating layer disposed over the gate. The contact at least partially overlaps at least one of the protrusions in the gate. A metal layer is disposed on the insulating layer. The metal layer includes a first structure shifted to a first side of the gate. The first structure at least partially overlaps the contact such that the contact electrically couples the first structure to the gate through the insulating layer.
申请公布号 WO2011025718(A1) 申请公布日期 2011.03.03
申请号 WO2010US46254 申请日期 2010.08.21
申请人 ADVANCED MICRO DEVICES, INC.;CARLSON, ANDREW, E. 发明人 CARLSON, ANDREW, E.
分类号 H01L27/02;H01L21/768;H01L21/8234;H01L27/088;H01L29/423 主分类号 H01L27/02
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