发明名称 |
Vorrichtung zur Erzeugung von feinen Mustern |
摘要 |
There are provided an apparatus for fine pattern formation, which can form a fine pattern with high accuracy by direct writing with ink, a production process of fine nozzles provided in the apparatus for fine pattern formation, and a method for fine pattern formation. Fine pattern formation with high accuracy could have been realized by the apparatus for fine pattern formation, comprising: a silicon substrate; a plurality of fine holes which extend through the silicon substrate from the surface of the silicon substrate to the back surface of the silicon substrate and have a silicon oxide layer on the wall surface thereof; fine nozzles which are protruded, integrally with the silicon oxide layer, on the back surface side of the silicon substrate from each opening of the fine holes; a silicon nitride layer provided on the surface and side of the silicon substrate;' a support member provided on the surface side of the silicon substrate; an ink passage for supplying ink to the opening of each fine hole on the surface side of the silicon substrate; and an ink supplying device connected to the ink passage. <IMAGE> |
申请公布号 |
DE60143881(D1) |
申请公布日期 |
2011.03.03 |
申请号 |
DE2001643881 |
申请日期 |
2001.07.23 |
申请人 |
DAI NIPPON PRINTING CO. LTD. |
发明人 |
FUJITA, HIROYUKI;MITA, YOSHIO;OHIGASHI, RYOICHI;TSUCHIYA, KATSUNORI |
分类号 |
B41J2/135;H01L21/00;B05B1/14;B05B5/025;B05C5/00;B05C5/02;B05C11/10;B05D1/04;B05D1/26;B41J2/005;B41J2/02;G02B5/20;G02F1/1335;G02F1/1345;H01L21/027;H01L51/00;H01L51/40 |
主分类号 |
B41J2/135 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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