| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENS |
| 摘要 |
<p>Disclosed is a photosensitive resin composition for a microlens. The photosensitive resin composition for a microlens comprises the following components (A), (B) and (C): (A) a polymer having a maleimide structure unit represented by formula (1); (B) a cross-linking agent; and (C) a photosensitizing agent.</p> |
| 申请公布号 |
WO2011024545(A1) |
申请公布日期 |
2011.03.03 |
| 申请号 |
WO2010JP60476 |
申请日期 |
2010.06.21 |
| 申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD.;KISHIOKA, TAKAHIRO;SAKAGUCHI, TAKAHIRO |
发明人 |
KISHIOKA, TAKAHIRO;SAKAGUCHI, TAKAHIRO |
| 分类号 |
G02B1/04;C08F22/40;C08L35/00;G02B3/00;G03F7/004;G03F7/023 |
主分类号 |
G02B1/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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