发明名称 METHOD OF MANUFACTURING PATTERNED SUBTRATE FOR CULTURING CELLS, PATTERNED SUBTRATE FOR CULTURING CELLS, PATTERNING METHOD OF CULTURING CELLS, AND PATTERNED CELL CHIP
摘要 The present invention relates to a method of manufacturing a patterned substrate for culturing cells, comprising the steps of: (1) preparing a substrate; (2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate; (3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and (4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma.
申请公布号 US2011053800(A1) 申请公布日期 2011.03.03
申请号 US20100872903 申请日期 2010.08.31
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 JUNG DONG GEUN;CHOI CHANG ROK;KIM KYUNG SEOP
分类号 C40B40/02;B05D5/00;C40B50/06;C40B60/14 主分类号 C40B40/02
代理机构 代理人
主权项
地址