发明名称 RESISTIVE HEATING DEVICE FOR FABRICATION OF NANOSTRUCTURES
摘要 The disclosed invention relates to apparatuses and techniques for a resistive heating device. The heating device may include a substrate, at least one electrically-conductive elongated structure disposed on the substrate, the at least one electrically-conductive elongated structure including at least one resistive portion having a conductivity lower than tha of the remaining portions of the at least one electrically-conductive elongated structure, and at least one heat- conductive column disposed on the at least one resistive portion of the at least one electrically-conductive elongated structure.
申请公布号 WO2011025288(A1) 申请公布日期 2011.03.03
申请号 WO2010KR05758 申请日期 2010.08.27
申请人 KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION 发明人 LEE, KWANGYEOL
分类号 H05B3/10 主分类号 H05B3/10
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