发明名称 METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
摘要 According to one embodiment, a method of fabricating a semiconductor device is disclosed. The method can include forming a debonding layer constituted with a thermoplastic resin on a supporting material, and forming an insulating layer constituted with a thermosetting resin including a solvent dissolving the thermoplastic resin on the debonding layer.
申请公布号 US2011053320(A1) 申请公布日期 2011.03.03
申请号 US20100850797 申请日期 2010.08.05
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MIURA MASAYUKI;HOMMA SOICHI;SHIMA MASAYA
分类号 H01L21/56 主分类号 H01L21/56
代理机构 代理人
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