发明名称 |
VAPOR DEPOSITION FILM |
摘要 |
<p>Disclosed is a vapor deposition film wherein a vapor deposition layer composed of a metal or an inorganic oxide is formed on at least one side of a resin layer (A) which is composed of a resin composition (1). The resin composition (1) is a polyglycol acid containing not less than 70% by mole of a specific structure (a structure represented by formula (1)) as a repeating unit. The surface on which the vapor deposition layer is deposited has a center line average roughness of 5-50 nm. The vapor deposition film has excellent gas barrier properties, excellent workability and decomposition resistance sufficient for practical use.</p> |
申请公布号 |
KR20110020301(A) |
申请公布日期 |
2011.03.02 |
申请号 |
KR20117001092 |
申请日期 |
2009.06.12 |
申请人 |
TORAY INDUSTRIES, INC.;KUREHA CORPORATION |
发明人 |
YAMAMURA GOUHEI;SUMI SAORI;KIMURA MASAHIRO;ABE SHUNSUKE;SATO TAKASHI;SATO HIROYUKI;MASUDA JUNICHI;SHINNUMADATE HIROSHI |
分类号 |
B32B15/08;B32B9/00;B32B27/36 |
主分类号 |
B32B15/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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