| 摘要 |
<p>PURPOSE: An inspection method and an apparatus are provided to detecting a fault and absence of a target by using dark field imaging. CONSTITUTION: In an inspection method and an apparatus, a target includes a plurality of recesses(22) having a certain depth. The recesses forms the pattern pitchers of an imprint template(20). A target is combined with the one lower part of the recesses. Radiation(42) is oriented to the imprint template and has a length as twice as an optical path(40) of the recesses.</p> |
