发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS |
摘要 |
PURPOSE: A semiconductor manufacturing apparatus is provided to form a desired pattern and remove an unnecessary pattern by minutely controlling the position and size of an optical spot on a substrate. CONSTITUTION: In a semiconductor manufacturing apparatus, an attenuator(206) compensate light from a light source(204) by uniform illuminance. A first optical system(210) transfers a modulated light to a diffraction device(212) which controls the interval and size of the light from the first optical system A second optical system(213) transfers the light from the diffraction device to a third optical system(214) which includes at least one objective lens. |
申请公布号 |
KR20110020197(A) |
申请公布日期 |
2011.03.02 |
申请号 |
KR20100080577 |
申请日期 |
2010.08.20 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD.;MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
GEORGE BARBASTATHIS;JOSE ANTONIO DOMINGUEZ CABALLERO;LEE, SUNG JIN;SATOSHI TAKAHASHI |
分类号 |
H01L21/26;H01L21/027 |
主分类号 |
H01L21/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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