发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE: A semiconductor manufacturing apparatus is provided to form a desired pattern and remove an unnecessary pattern by minutely controlling the position and size of an optical spot on a substrate. CONSTITUTION: In a semiconductor manufacturing apparatus, an attenuator(206) compensate light from a light source(204) by uniform illuminance. A first optical system(210) transfers a modulated light to a diffraction device(212) which controls the interval and size of the light from the first optical system A second optical system(213) transfers the light from the diffraction device to a third optical system(214) which includes at least one objective lens.
申请公布号 KR20110020197(A) 申请公布日期 2011.03.02
申请号 KR20100080577 申请日期 2010.08.20
申请人 SAMSUNG ELECTRONICS CO., LTD.;MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 GEORGE BARBASTATHIS;JOSE ANTONIO DOMINGUEZ CABALLERO;LEE, SUNG JIN;SATOSHI TAKAHASHI
分类号 H01L21/26;H01L21/027 主分类号 H01L21/26
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