发明名称 INSULATING-GATE FET AND ITS MANUFACTURING METHOD
摘要 <p>Provided is an IGFET capable of turning off when a reverse voltage is applied. The IGFET includes an n + -type first drain region (6), an n - -type second drain region (7), a p-type first body region (8), a p - -type second body region (9), an n-type first source region (10a), and an n + -type second source region (10b). Gate insulators (5) and gate electrodes (4) are arranged in trenches (11) formed on a semiconductor substrate (1). The source electrode (3) is in ohmic contact with the n-type first source region (10a) and the n + -type second source region (10b) and in schottky barrier contact with the p-- type second body region (9).</p>
申请公布号 EP2093802(A4) 申请公布日期 2011.03.02
申请号 EP20070832897 申请日期 2007.11.30
申请人 SANKEN ELECTRIC CO., LTD. 发明人 TAKAHASHI, RYOJI
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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