发明名称 Mask data generation method, mask fabrication method, exposure method, device fabrication method, and program
摘要 The invention provides a generation method of generating data of a mask, comprising a calculation step of calculating an aerial image formed on an image plane of a projection optical system, an extraction step of extracting a two-dimensional image from the aerial image, a determination step of determining a main pattern of the mask based on the two-dimensional image, an extraction step of extracting, from the aerial image, a peak portion at which a light intensity takes a peak value in a region other than a region in which the main pattern is projected, a determination step of determining an assist pattern based on the light intensity of the peak portion, and a generation step of inserting the assist pattern into a portion of the mask, which corresponds to the peak portion, thereby generating, as the data of the mask, pattern data including the assist pattern and the main pattern.
申请公布号 EP2040120(B1) 申请公布日期 2011.03.02
申请号 EP20080163469 申请日期 2008.09.02
申请人 CANON KABUSHIKI KAISHA 发明人 KAWASHIMA, MIYOKO
分类号 G03F1/00;G03F1/36 主分类号 G03F1/00
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