发明名称 |
Ultrathin ferromagnetic/antiferromagnetic coupling film structure and fabrication method thereof |
摘要 |
The present invention provides a ferromagnetic/antiferromagnetic coupling film structure and a fabrication method thereof. The structure includes an antiferromagnetic layer of cobalt oxide having a thickness of 2 to 15 monolayers and formed on a substrate at a temperature ranging from 700K to 900K; and a ferromagnetic layer of cobalt having a thickness of at least one monolayer for being formed on the antiferromagnetic layer of cobalt oxide.
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申请公布号 |
US7897200(B2) |
申请公布日期 |
2011.03.01 |
申请号 |
US20080183164 |
申请日期 |
2008.07.31 |
申请人 |
NATIONAL CHUNG CHENG UNIVERSITY |
发明人 |
TSAY JYH-SHEN;LEE CHI-WEI;CHERN GUNG |
分类号 |
G11B21/00;B05D1/18;B22F3/00;B32B7/02;C23C8/10;C25D3/00;C25D3/12;G11B5/33;G11C19/08 |
主分类号 |
G11B21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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