发明名称 Ultrathin ferromagnetic/antiferromagnetic coupling film structure and fabrication method thereof
摘要 The present invention provides a ferromagnetic/antiferromagnetic coupling film structure and a fabrication method thereof. The structure includes an antiferromagnetic layer of cobalt oxide having a thickness of 2 to 15 monolayers and formed on a substrate at a temperature ranging from 700K to 900K; and a ferromagnetic layer of cobalt having a thickness of at least one monolayer for being formed on the antiferromagnetic layer of cobalt oxide.
申请公布号 US7897200(B2) 申请公布日期 2011.03.01
申请号 US20080183164 申请日期 2008.07.31
申请人 NATIONAL CHUNG CHENG UNIVERSITY 发明人 TSAY JYH-SHEN;LEE CHI-WEI;CHERN GUNG
分类号 G11B21/00;B05D1/18;B22F3/00;B32B7/02;C23C8/10;C25D3/00;C25D3/12;G11B5/33;G11C19/08 主分类号 G11B21/00
代理机构 代理人
主权项
地址