发明名称 Method for manufacturing magnetoresistance effect element
摘要 A method is for manufacturing a magnetoresistance effect element having a magnetization fixed layer, a non-magnetic intermediate layer, and a magnetization free layer being sequentially stacked. The method includes: forming at least a part of a magnetic layer that is to become either one of the magnetization fixed layer and the magnetization free layer; forming a function layer including at least one of an oxide, a nitride, and a fluoride on the part of the magnetic layer; and removing a part of the function layer by exposing the function layer to either one of an ion beam and plasma irradiation.
申请公布号 US7897201(B2) 申请公布日期 2011.03.01
申请号 US20070703830 申请日期 2007.02.08
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YUASA HIROMI;FUKUZAWA HIDEAKI;FUJI YOSHIHIKO;IWASAKI HITOSHI
分类号 G11B21/00;B05D3/00;C23F3/00;H05H1/00 主分类号 G11B21/00
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