发明名称 Method of forming vertically offset bond on trace interconnects on recessed and raised bond fingers
摘要 A method of making a semiconductor device comprises forming a first conductive layer recessed below a surface of a substrate. The method further comprises forming a second conductive layer raised above the surface of the substrate to create a vertical offset between the first and second conductive layers. The method further comprises forming an interconnect structure on the first and second conductive layers.
申请公布号 US7897502(B2) 申请公布日期 2011.03.01
申请号 US20080207986 申请日期 2008.09.10
申请人 STATS CHIPPAC, LTD. 发明人 JANG KIYOUN;KIM SUNGSOO;KANG YONGHEE
分类号 H01L21/44 主分类号 H01L21/44
代理机构 代理人
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