发明名称 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER.
摘要 A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures. The trenches are filled with a grid material to form walls of the grid material, and the base material is selectively removed until the grid material is exposed and forms the spaces between the walls of the grid material for the apertures.
申请公布号 NL2005119(A) 申请公布日期 2011.03.01
申请号 NL20102005119 申请日期 2010.07.21
申请人 ASML NETHERLANDS B.V.,;KONINKLIJKE PHILIPS ELECTRONICS B.V., 发明人 SOER, WOUTER;JAK, MARTIN;DEKKER, RONALD
分类号 G03F7/20;G21K1/06 主分类号 G03F7/20
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