发明名称 Lithographic apparatus, device manufacturing method, and use of a radiation collector
摘要 A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.
申请公布号 US7897941(B2) 申请公布日期 2011.03.01
申请号 US20080289778 申请日期 2008.11.04
申请人 ASML NETHERLANDS B.V. 发明人 FRANKEN JOHANNES CHRISTIAAN LEONARDUS;STRUYCKEN ALEXANDER MATTHIJS;VAN DEN SCHOOR LEON JOSEPH MARIE
分类号 G01N21/33;B08B3/10;G03B27/72 主分类号 G01N21/33
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