发明名称 |
Lithographic apparatus, device manufacturing method, and use of a radiation collector |
摘要 |
A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.
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申请公布号 |
US7897941(B2) |
申请公布日期 |
2011.03.01 |
申请号 |
US20080289778 |
申请日期 |
2008.11.04 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
FRANKEN JOHANNES CHRISTIAAN LEONARDUS;STRUYCKEN ALEXANDER MATTHIJS;VAN DEN SCHOOR LEON JOSEPH MARIE |
分类号 |
G01N21/33;B08B3/10;G03B27/72 |
主分类号 |
G01N21/33 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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