| 发明名称 |
Method for manufacturing relief holographic diffraction gratings |
| 摘要 |
The invention relates to holography, semiconductor photography and photolithography and can be used in optical instrument engineering, laser technology, optoelectronics, replication of optical information (holographic or analog) and for the protection of industrial goods and securities.The method for manufacturing relief holographic diffraction gratings in thin-layer structure metal-chalcogenide glass-like semiconductor Cu-As2Se3 includes its coherent radiation with the application of an electric field of corona discharge and subsequent processing in a selective etchant. |
| 申请公布号 |
MD341(Y) |
申请公布日期 |
2011.02.28 |
| 申请号 |
MDS20100133 |
申请日期 |
2010.07.30 |
| 申请人 |
INSTITUTUL DE FIZICA APLICATA AL ACADEMIEI DE STIINTE A MOLDOVEI;INSTITUTUL DE FIZIC&ABREVE, APLICAT&ABREVE, AL ACADEMIEI DE &SCEDIL,TIIN&TCEDIL,E A MOLDOVEI |
发明人 |
TRIDUH GHENADII;PRISAKARI ALEXANDR;ANDRIESH ANDREI;NASTAS ANDRIAN;PRISACAR ALEXANDRU;ANDRIE&SCEDIL, ANDREI |
| 分类号 |
H01L31/14;C01B19/04;C01G28/00;C23C14/06;C23C14/24;C23F1/00;C23F1/14;C23F1/32;G02B5/18;G03C9/08;G03H1/00 |
主分类号 |
H01L31/14 |
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