| 发明名称 |
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN, AND ELECTRONIC COMPONENT |
| 摘要 |
<p>A positive tone photosensitive composition comprising: (A) an alkali-soluble resin having a phenolic hydroxyl group; (B) a phenol resin modified by a compound having an unsaturated hydrocarbon group containing 4 to 100 carbon atoms; (C) a compound that generates an acid by the action of light; (D) a thermal cross-linker that crosslinks the ingredient (A) and the ingredient (B) by heating; and (E) a solvent.</p> |
| 申请公布号 |
KR20110019443(A) |
申请公布日期 |
2011.02.25 |
| 申请号 |
KR20117002154 |
申请日期 |
2009.09.02 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
MATSUTANI HIROSHI;UENO TAKUMI;NICOLAS ALEXANDRE;NANAUMI KEN |
| 分类号 |
G03F7/039;G03F7/022;G03F7/40;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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