| 摘要 |
PURPOSE: A substrate processing apparatus and a processing method thereof are provided to minimize a process error and the deterioration of productivity by monitoring the process solution discharge status of a nozzle unit in real time. CONSTITUTION: A substrate support unit is arranged on the bottom of the inner side of a frame and fixes the substrate. A nozzle unit(140,150) supplies process solution to the substrate fixed to the substrate support unit. A vision system(190) is installed on the upper side of the substrate support unit and monitors the process solution discharge status of a nozzle unit in real time. The vision system senses the discharge of the process solutions from the discharge terminal of the nozzle unit to the substrate when the process solution is not supplied to the nozzle unit.
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