| 摘要 |
PURPOSE: A device and a method for removing polymer are provided to suppress particles by not rotating a substrate. CONSTITUTION: A process container(11) receives a substrate with edges to which polymer is circularly attached. The substrate is mounted on a mounting stand(12). A laser radiating unit radiates a ring type laser beam to the polymer circularly attached to the substrate. An ozone gas supply device supplies ozone gas to the polymer circularly attached to the substrate. An exhaust device(23,24) exhausts ozone gas. |
