| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which can shorten a measurement time of a focus value and obtain the accurate focus value, and to provide an exposure device. <P>SOLUTION: The method of manufacturing the semiconductor device acquires focus values measured for regions having different reflectance respectively due to films formed at a lower layer than a resist 6 formed above a wafer 3, brings a focus value acquired at a second region 32 having a higher reflectance than that of a first region 31 closer to a focus value acquired at the first region 31 having a lower reflectance, and carries out exposure processing. <P>COPYRIGHT: (C)2011,JPO&INPIT |
