| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure a wavefront aberration with high precision on the basis of sharp interference fringes for the entire pupil plane of an optical system to be inspected. <P>SOLUTION: A wavefront aberration measuring apparatus (1) which measures the wavefront aberration of the optical system to be inspected includes a diffraction grating (10) which causes light emitted from a predetermined region (PH) on a body surface (OB) and passed through the optical system to be inspected to interfere, an optical detection part (12) which detects a first interference fringe passed through the first region of the pupil plane of the optical system to be inspected and formed by the diffraction grating, and a second interference fringe passed through a second region and formed by the diffraction grating, setting parts (11, 14) which set at least one of detection conditions of the first interference fringe and detection conditions of the second interference fringe when the optical detection part detects the first interference fringe and second interference fringe, and a measurement part (13) which measures the wavefront aberration on the basis of the first interference fringe and second interference fringe that the optical detection part detects under the conditions set by the setting parts. <P>COPYRIGHT: (C)2011,JPO&INPIT |
