发明名称 Deep trench isolation structure
摘要 A deep trench isolation structure including a deep trench disposed within a substrate to surround an active area on the substrate and a dielectric material filled within the deep trench. The deep trench comprises at least a corner in an arc shape layout or in a polygonal line shape layout. Accordingly, the deep trench isolation structure can be obtained in a better stress condition and with less process time for trench filling.
申请公布号 US2011042777(A1) 申请公布日期 2011.02.24
申请号 US20090542721 申请日期 2009.08.18
申请人 JHANG YOU-DI;HUANG CHUN-YAO;HO KUO-HUA 发明人 JHANG YOU-DI;HUANG CHUN-YAO;HO KUO-HUA
分类号 H01L29/06 主分类号 H01L29/06
代理机构 代理人
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