发明名称 Semiconductor device and method of manufacturing semiconductor device
摘要 A first transistor includes a first gate insulating film, a first gate electrode, and a first sidewall. A second transistor includes a second gate insulating film, a second gate electrode, and a second sidewall. A capacitive element is connected to one side of source and drain regions of the second transistor. The first gate insulating film has the same thickness as that of the second gate insulating film, and the first gate electrode has the same thickness of that of the second gate electrode. The width of the second sidewall is larger than the width of the first sidewall.
申请公布号 US2011042749(A1) 申请公布日期 2011.02.24
申请号 US20100805291 申请日期 2010.07.22
申请人 RENESAS ELECTRONICS CORPORATION 发明人 KAWASAKI TORU;KURA SATOSHI;NISSA MITSUO;KAMISHITA NAOTAKA
分类号 H01L27/088;H01L21/8234 主分类号 H01L27/088
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