发明名称 NEW COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a compound capable of forming patterns having excellent pattern resolution and line edge roughness, and to provide a resist composition using the same. <P>SOLUTION: There is provided a compound represented by formula (I-Pb), [wherein, X<SP>Pb</SP>is a single bond or -O-; R<SP>Pb</SP>is a single bond, a divalent aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by oxygen atom or a carbonyl group; Y<SP>Pb</SP>is a polymerizable group; Z<SP>Pb</SP>is an organic group; X<SP>Pc</SP>is a single bond or an alkylene group; R<SP>Pc</SP>is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group which may have one or more substituents; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by an oxygen atom or a carbonyl group]. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011037835(A) 申请公布日期 2011.02.24
申请号 JP20100155689 申请日期 2010.07.08
申请人 SUMITOMO CHEMICAL CO LTD 发明人 ICHIKAWA KOJI;SUGIHARA MASAKO;YAMASHITA HIROKO
分类号 C07C381/12;C07C53/10;C07C62/24;C07C63/08;C07D333/76;C08F20/38;C09K3/00;G03F7/004;G03F7/039 主分类号 C07C381/12
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