| 摘要 |
An object of the present invention is to provide a fluid mixing system able to mix the fluids of different lines by any ratio and control the flow rates of even pulsating fluids, able to control the flow rate of even a pulsating fluid, compact in configuration and able to be installed in a narrow space, and enabling easy pipe laying and pipe connection at the time of installation. In the system of the present invention, its two feed lines are provided with first and second fluid control valves, flow rate measuring devices measuring the actual flow rates of the lines and outputting signals, and control units outputting command signals for controlling the fluid control valves and mixing the fluids flowing through the two feed lines by any ratio. The first fluid control valve controls the pressure of the fluid by the pressure operation of the control fluid, while the second fluid control valve changes the opening area of the channel to control the flow rate of the fluid. In the system of the present invention, for example, to obtain a washing solution for semiconductor production, hydrofluoric acid or hydrochloric acid is mixed with pure water by a ratio of 1 part to 10 to 200 parts.
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