发明名称
摘要 <p>An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.</p>
申请公布号 JP2011505270(A) 申请公布日期 2011.02.24
申请号 JP20100534971 申请日期 2008.11.21
申请人 发明人
分类号 B29C59/02;B29C33/38;B41F17/14;B41N1/12;H01L21/027 主分类号 B29C59/02
代理机构 代理人
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