| 摘要 |
PROBLEM TO BE SOLVED: To provide an interference microscope and a measuring apparatus, capable of measuring the surface shape of a sample (object to be measured) such as a wafer just by slightly inclining a reference mirror by a simple structure, identify accurate coordinate positions of dirt, pole pieces, etc., transmit and receive their accurate data to a charged particle beam device such as an electronic microscope and an image drawing device, and contribute more to an improvement in workability. SOLUTION: In the interference microscope and the measuring apparatus wherein the sample such as the wafer is irradiated with a laser beam, and the surface inside of the sample is observed and inspected by using an interferometer, a reference optical path for guiding light between a beam splitter and the reference mirror is provided, and a measuring optical path for guiding light between the beam splitter and the sample is also provided, and thereby an optical light path difference is made between the reference optical path and the measuring optical path. Furthermore, interference fringes are formed in a detecting means by slightly inclining the reference mirror by a minute amount. COPYRIGHT: (C)2011,JPO&INPIT |
