SUBSTRATES AND MIRRORS FOR EUV MICROLITHOGRAPHY, AND METHODS FOR PRODUCING THEM

摘要

The present invention relates to mirrors that comprise a reflecting coating for the EUV wavelength region and a substrate, a surface region of the substrate extending uniformly below the reflecting coating along this coating and, seen from the surface of the substrate, has a depth of down to 5 µm. Here, this surface region has a 2% higher density than the remaining substrate. Moreover, the invention relates to substrates that likewise have such surface regions. The invention further relates to methods for producing such mirrors and substrates having such surface regions by irradiation by means of ions or electrons.