发明名称 |
METHOD FOR FABRICATING A PHYSICAL VAPOR DEPOSITION TARGET |
摘要 |
The present invention relates to a method for fabricating a CIS-based target for use in depositing an absorption layer of a solar cell. The method comprises: (a) a step of preparing a Cu, In and Se powder with a mole ratio of 1:1:2; (b) a step of stirring the Cu, In and Se powder and metal balls in a vessel to produce a synthesized CIS material by mechanical force; (c) a step of adding Se to the synthesized CIS material, and mixing and compressing the synthesized CIS material using a ball mill to produce a pellet having a shape corresponding to a target; and (d) a step of performing a heat treatment on the thus-produced pellet to produce a final CIS target. |
申请公布号 |
WO2011021800(A2) |
申请公布日期 |
2011.02.24 |
申请号 |
WO2010KR05198 |
申请日期 |
2010.08.09 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY;CHO, YONG SOO;YEON, DEUK HO |
发明人 |
CHO, YONG SOO;YEON, DEUK HO |
分类号 |
H01L21/203;H01L31/042 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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