发明名称 |
ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an illumination optical system forming a pupil intensity distribution in a highly continuous circumferentially polarized state. <P>SOLUTION: The illumination optical system (2-10) illuminating a face (M) to be illuminated with light from a light source (1) includes: a distribution-forming optical system (2-4) which forms a pupil intensity distribution in the illumination pupil of the distribution forming optical system based on light from the light source, and causes a plurality of light fluxes having polarized states different from one another to enter each of a plurality of pupil regions of the pupil intensity distribution; and a first optical element (5) disposed at or near the illumination pupil and having a plurality of divided regions corresponding to the plurality of pupil regions. Two adjoining divided regions out of the plurality of divided regions have polarization conversion characteristics different from each other. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011040646(A) |
申请公布日期 |
2011.02.24 |
申请号 |
JP20090188172 |
申请日期 |
2009.08.17 |
申请人 |
NIKON CORP |
发明人 |
TANITSU OSAMU |
分类号 |
H01L21/027;G02B3/00;G02B5/00;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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