发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an illumination optical system forming a pupil intensity distribution in a highly continuous circumferentially polarized state. <P>SOLUTION: The illumination optical system (2-10) illuminating a face (M) to be illuminated with light from a light source (1) includes: a distribution-forming optical system (2-4) which forms a pupil intensity distribution in the illumination pupil of the distribution forming optical system based on light from the light source, and causes a plurality of light fluxes having polarized states different from one another to enter each of a plurality of pupil regions of the pupil intensity distribution; and a first optical element (5) disposed at or near the illumination pupil and having a plurality of divided regions corresponding to the plurality of pupil regions. Two adjoining divided regions out of the plurality of divided regions have polarization conversion characteristics different from each other. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011040646(A) 申请公布日期 2011.02.24
申请号 JP20090188172 申请日期 2009.08.17
申请人 NIKON CORP 发明人 TANITSU OSAMU
分类号 H01L21/027;G02B3/00;G02B5/00;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址