发明名称 COMPOSITION FOR POLISHING SURFACES OF SILICON DIOXIDE
摘要 A composition for polishing surfaces comprises the following components: a) at least one inorganic abrasive component (S) comprising a lanthanide oxide, b) at least one organic dispersing-agent component based on polymer (P), c) at least one organic gelling agent (G) such as gellan gum, d) water as solution or dispersing medium, and e) if appropriate further auxiliary and additive materials and has high stability.
申请公布号 US2011045671(A1) 申请公布日期 2011.02.24
申请号 US20070521653 申请日期 2007.12.28
申请人 BASF SE 发明人 BEHRENS SVEN HOLGER;LIU YAQIAN;KERN GUENTER;DEBUS HEIDRUN
分类号 H01L21/465;C09K13/00;H01L21/463 主分类号 H01L21/465
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