发明名称 GAS-ASSISTED LASER ABLATION
摘要 <P>PROBLEM TO BE SOLVED: To provide an improved method for laser processing that prevents material redeposition during laser ablation but allows material to be removed at a high rate. <P>SOLUTION: In a preferred embodiment, laser ablation is performed in a chamber filled with high pressure precursor gas (etching gas) so that sample particles ejected during laser ablation will react with the precursor gas in a gas atmosphere of the sample chamber. When the ejected particles collide with precursor gas particles, the precursor is dissociated, forming a reactive component that bonds to the ablated material. In turn, the reaction between the reactive dissociation by-product and the ablated material forms a new, volatile compound that can be pumped away in a gaseous state rather than redepositing onto the sample. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011040747(A) 申请公布日期 2011.02.24
申请号 JP20100178698 申请日期 2010.08.09
申请人 FEI CO 发明人 STRAW MARCUS;TOTH MILOS
分类号 H01L21/302;B23K26/12;B23K26/16;B23K26/36 主分类号 H01L21/302
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