发明名称 METHOD FOR IMPROVING ADHESION OF ULTRAVIOLET-CROSSLINKABLE MATERIAL TO SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for improving adhesion of a layer made of a material that is crosslinkable by exposure to ultraviolet rays to a substrate, and a method for producing a transistor utilizing the same. SOLUTION: When improving adhesion of a layer made of a material M that is crosslinkable by exposure to ultraviolet rays to the surface of a substrate S, (a) a deposition step of an unpolymerized polymerizable composition P including at least one molecule F including a first reactive group F1 that is reactive with a reactive group M1 of the surface of the material M and a second reactive group F2 that is capable of forming bonds with the material(s) constituting the surface of the substrate S, (b) a deposition step of a layer made of the uncrosslinked material M on the layer of the unpolymerized composition P obtained in the step (a), and (c) a step of exposing the three-layer structure obtained in the step (b) to ultraviolet rays are included. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011038086(A) 申请公布日期 2011.02.24
申请号 JP20100154860 申请日期 2010.07.07
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE & AUX ENERGIES ALTERNATIVES 发明人 HEITZMANN MARIE;BENWADIH MOHAMMED
分类号 C09J201/00;C09J4/00;C09J4/02;C09J5/02;C09J175/16;H01L21/336;H01L21/768;H01L29/786;H01L51/05 主分类号 C09J201/00
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