发明名称 GAS PORT STRUCTURE AND PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a gas port structure capable of preventing air from leaking and infiltrating into a processing vessel from a sealing part of a gas pipe. SOLUTION: The gas port structure, which introduces a gas into the processing vessel capable of vacuum exhausting to process an object, includes a gas introducing port which is provided to the end part of the processing vessel together with a nozzle inserting hole for inserting a gas nozzle, a gas introduction tube where the end part of the gas nozzle inserted into the nozzle inserting hole is inserted and connected, a seal member interposed between the end part of the gas introduction tube and the gas introducing port, a covering body so provided on the outer peripheral side of the seal member with space therebetween and cover the space, a pressing member which urges the gas introduction tube toward the gas introducing to press the seal member so that the connection part between the gas nozzle and the gas introduction tube is sealed, and an inert gas supply means for supplying the inert gas to the space. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011040636(A) 申请公布日期 2011.02.24
申请号 JP20090187843 申请日期 2009.08.13
申请人 TOKYO ELECTRON LTD 发明人 KANEKO YASUSHI;SATO KENICHI
分类号 H01L21/31;C23C14/56;C23C16/44;H01L21/22 主分类号 H01L21/31
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